Keyword: ECR
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TUPHA012 New Control System for LAPECR2 ion, controls, operation, high-voltage 394
  • J.J. Chang, S. An, X.J. Liu, P.P. Wang, Y.J. Yuan, W. Zhang
    IMP/CAS, Lanzhou, People's Republic of China
  Lanzhou All Permanent magnet ECR ion source No.2 (LAPECR2) is the ion source for 320 kV multidiscipline research platform for highly charged ions. Its old control system has been used for nearly 12 years and some prob-lems have been gradually exposed and affected its daily operation. A set of PLC from Beckhoff company is in charge of the control of magnet power supplies, diagnos-tics and motion control. EPICS and Control System Studio (CSS) as well other packages are used in this facility as the control software toolkit. Based on these state-of-the-art technologies on both hardware and software, this paper designed and implemented a new control system for LAPECR2. After about half a year of running, the new control reflects its validity and stability in this facility.  
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