Keyword: quadrupole
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THPHA003 Installation and the Hardware Commissioning of the European XFEL Undulator Systems ion, undulator, controls, vacuum 1344
  • M. Yakopov, S. Abeghyan, S. Karabekyan, J. Pflüger
    XFEL. EU, Schenefeld, Germany
  This article describes in detail the steps of hardware installation and commissioning of components for undulator systems at European XFEL. In general, the work can be divided into 3 different steps: installation, alignment, and commissioning. During installation step, the following main components were rolled into the tunnel: - undulators with the control cabinets, intersection control cabinets, phase shifters, quadrupole movers, correction coils. They have been mounted according to the designed positions. Then all mentioned components have been aligned according to the specifications. Finally, the cabling has been done and basic tests were performed. As part of the commissioning, the calibration of the temperature sensors, as well as the measurements of the quadrupole mover travel distance has been done in the tunnel. Afterwards, the undulator limit switches and hard stops were adjusted to secure the vacuum chamber by closing the undulator gap up to 10mm. Eventually, the system was handed over to the global control system in order to perform all functional tests. The main focus is given to the components which are controlled or monitored by the undulator local control system [1].  
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THPHA116 Emittance Measurement and Optics Matching at the European XFEL ion, FEL, emittance, optics 1655
  • S.M. Meykopff, B. Beutner
    DESY, Hamburg, Germany
  Electron beam quality described by the emittance or phase space moments are important for the operation of FEL facilities like the European XFEL. For the operation these parameters need to be routinely measured. Based on such measurements machine setup can be optimized to match beam requirements. The beam parameters depend on parameters like quadrupole magnet strength or RF settings. While manual tuning is possible, we aim for highly automatized procedures to obtain such optimizations. In this paper we will present and discuss an overview of the different subsystems which are involved. These include image acquisition, analysis, and optics calculations as well as machine control user interfaces.  
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THPHA120 Compensation Controls for an Elliptically Polarising Undulator ion, controls, software, undulator 1658
  • J. Willard, T. Wilson, W.A. Wurtz
    CLS, Saskatoon, Saskatchewan, Canada
  Funding: NRC, WD, NSERC, CIHR, University of Saskatchewan, Government of Saskatchewan, and CFI
At the Canadian Light Source (CLS) synchrotron, the addition of the Quantum Materials Spectroscopy Centre (QMSC) beamline requires the addition of an Elliptically Polarizing Undulator (EPU) insertion device to produce photons from the stored electron beam. Unlike the majority of such insertion devices, this EPU is capable of producing photons of simultaneous arbitrary elliptical and linear phases, in addition to a range of energies. This EPU is also capable of creating perturbations of the stored electron beam sufficient to cause an interruption of an injection. In order to prevent this, compensation controls have been developed. These controls are accomplished with a combination of Experimental Physics and Industrial Control System (EPICS), mathematical models, and algorithms written in C and MATLAB.
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